Fault-tolerant designs for 256 Mb DRAM
- Toshiaki Kirihata
- Yohji Watanabe
- et al.
- 1996
- IEEE Journal of Solid-State Circuits
Publications
56 results for M. Wordeman
Fault-tolerant designs for 256 Mb DRAM
- Toshiaki Kirihata
- Yohji Watanabe
- et al.
- 1996
- IEICE Transactions on Electronics
A 286 mm2 256 Mb DRAM with ×32 both-ends DQ
- Yohji Watanabe
- Hing Wong
- et al.
- 1996
- IEICE Transactions on Electronics
A Comprehensive Study of Hot-Carrier Instability in P- and N-Type Poly-SI Gated MOSFET’s
- Charles C.-H. Hsu
- Duen-Shun Wen
- et al.
- 1994
- IEEE Transactions on Electron Devices
170 nm gates fabricated by phase-shift mask and top anti-reflector process
- T.A. Brunner
- P.N. Sanda
- et al.
- 1993
- Microlithography 1993
A High-Performance 0.25-μm CMOS Technology: I—Design and Characterization
- Wen-Hsing Chang
- Bijan Davari
- et al.
- 1992
- IEEE T-ED
A High-Performance 0.25-μm CMOS Technology: II—Technology
- Bijan Davari
- Wen-Hsing Chang
- et al.
- 1992
- IEEE T-ED
A New “Shift and Ratio” Method for MOSFET Channel-Length Extraction
- Yuan Taur
- D.S. Zicherman
- et al.
- 1992
- IEEE Electron Device Letters
Fabrication of CMOS on ultrathin SOI obtained by epitaxial lateral overgrowth and chemical-mechanical polishing
- G. Shahidi
- B. Davari
- et al.
- 1990
- IEDM 1990
Radiation damage and its effect on hot-carrier induced instability of 0.5 μm CMOS devices patterned using synchrotron x-ray lithography
- C.C.-H. Hsu
- L.K. Wang
- et al.
- 1990
- Journal of Electronic Materials