Development of a Plasma Etching Process of Copper for the Microfabrication of High-Density Interconnects in Advanced PackagingJuliano BorgesMaxime Darnonet al.2023ECTC 2023
1.65 µm L/S high density interconnect on organic substrate by advanced semi-additive process for HPC applicationsHussein HamiehJuliano Borgeset al.2023ECTC 2023