Publications

2 results for Craig Huffman

Moving from thin films to atomic layers - Atomic layer etching
- - Craig Huffman
  - Eric A. Joseph
  - et al.
- 2015
- VLSI-TSA 2015
High performance gate first HfSiON dielectric satisfying 45nm node requirements
- - M.A. Quevedo-Lopez
  - S. Krishnan
  - et al.
- 2005
- IEDM 2005