Publications

7 results for Ioana Graur

Lithographic qualification of high-Transmission mask blank for 10nm node and beyond
- - Yongan Xu
  - Tom Faure
  - et al.
- 2016
- SPIE Advanced Lithography 2016
SMO photomask inspection in the lithographic plane
- - Emily Gallagher
  - Karen Badger
  - et al.
- 2009
- SPIE Photomask Technology + EUV Lithography 2009
Isotropic treatment of EMF effects in advanced photomasks
- - Jaione Tirapu Azpiroz
  - Alan E. Rosenbluth
  - et al.
- 2009
- SPIE Photomask Technology + EUV Lithography 2009
Characterization of Across-device Linewidth Variation (ADLV) for 65 nm logic SRAM using CDSEM and linewidth roughness algorithms
- - W. Chu
  - C. Radens
  - et al.
- 2006
- SPIE Advanced Lithography 2006
Image fidelity verification - ContourIFV
- - Ioana Graur
  - Rama N. Singh
  - et al.
- 2004
- AMM 2004
Enabling the 70 nm technology node with 193 nm altPSM lithography
- - Lars Liebmann
  - Jennifer Lund
  - et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering
Enabling alternating phase shifted mask designs for a full logic gate level: Design rules and design rule checking
- - Lars Liebmann
  - Jennifer Lund
  - et al.
- 2001
- Proceedings - Design Automation Conference