Publications

9 results for Chris Progler

Low-n absorber EUV masks: mask manufacturing assessment through process characterization and optimization with early look at EUV Low-NA and High-NA imaging performance
- - Henry Kamberian
  - Jed Rankin
  - et al.
- 2024
- SPIE Photomask Technology + EUV Lithography 2024
EUVL mask process development and verification using advanced modeling and characterization techniques
- - Michael Green
  - Romain Lallement
  - et al.
- 2020
- SPIE Advanced Lithography 2020
EUV mask challenges and requirements for ultimate single exposure interconnects
- - Chris Progler
  - Michael Green
  - et al.
- 2019
- SPIE Advanced Lithography 2019
Methodology for generating exposure tool specification for alternating phase shift mask application for 70 nm node
- - Kafai Lai
  - Gregg Gallatin
  - et al.
- 2002
- SPIE Advanced Lithography 2002
Scattered light: The increasing problem for 193 nm exposure tools and beyond
- - Kafai Lai
  - Chung-Hsi Wu
  - et al.
- 2001
- Microlithography 2001
Simulation enabled decision making in advanced lithographic manufacturing
- - C. Progler
- 2001
- Microelectronic and MEMS Technologies 2001
Zernike coefficients: Are they really enough?
- - C. Progler
  - Alfred K. Wong
- 2000
- SPIE Advanced Lithography 2000
Optical lens specifications from the user's perspective
- - Christopher J. Progler
  - Donald C. Wheeler
- 1998
- SPIE Advanced Lithography 1998
Understanding high numerical aperture optical lithography
- - D. Flagello
  - Alan E. Rosenbluth
  - et al.
- 1992
- Microelectronic Engineering