Planarity considerations in SADP for advanced BEOL patterning
- James H.-C. Chen
- Terry A. Spooner
- et al.
- 2017
- IITC 2017
Publications
5 results for Ben Kim
Segment removal strategy in SAQP for advanced BEOL application
- James H.-C. Chen
- Terry A. Spooner
- et al.
- 2017
- IITC 2017
Reducing density-induced CMP non-uniformity for advanced semiconductor technology nodes
- John H. Zhang
- Wei-Tsu Tseng
- et al.
- 2013
- MRS Spring Meeting 2013
Cu CMP and its challenge for 20nm nodes and beyond
- John H. Zhang
- Wei-Tsu Tseng
- et al.
- 2012
- MRS Spring Meeting 2012
Effect of TaN stoichiometry on barrier oxidation and defect density in 32nm Cu/ultra-low K interconnects
- Andrew H. Simon
- Frieder Baumann
- et al.
- 2010
- MRS Online Proceedings Library