Chemical and structural characterization of EUV photoresists as a function of depth by standing-wave x-ray photoelectron spectroscopy
- Giuseppina Conti
- Henrique P. Martins
- et al.
- 2021
- JM3
Publications
5 results for Patrick Naulleau
Fundamental understanding of chemical processes in extreme ultraviolet resist materials
- Oleg Kostko
- Bo Xu
- et al.
- 2018
- Journal of Chemical Physics
Initial experience establishing a EUV baseline lithography process for manufacturability assessment
- O.R. Wood II
- D. Back
- et al.
- 2007
- SPIE Advanced Lithography 2007
Investigation of the current resolution limits of advanced extreme ultraviolet (EUV) resists
- Patrick P. Naulleau
- Clemens Rammeloo
- et al.
- 2006
- SPIE Advanced Lithography 2006
Line-edge roughness transfer function and its application to determining mask effects in EUV resist characterization
- Patrick P. Naulleau
- Gregg M. Gallatin
- 2003
- Applied Optics