Boron activation and diffusion in silicon and strained silicon-on-insulator by rapid thermal and flash lamp annealings
- F. Lanzerath
- D. Buca
- et al.
- 2008
- Journal of Applied Physics
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.