IVB-6 a-Si Thin Film Transistors Using Dilute-Gas Plasma-Enhanced Chemical Vapor Deposition
- S.L. Wright
- M.B. Rothwell
- et al.
- 1993
- IEEE Transactions on Electron Devices
Publications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
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46 results for Yue Kuo
Reactive ion etching technology in thin-film-transistor processing
- Y. Kuo
- 1992
- IBM J. Res. Dev
Reactive ion etch damages in inverted, trilayer thin-film transistor
- Yue Kuo
- 1992
- Applied Physics Letters
Characterization of Indium Tin Oxide and Reactive Ion Etched Indium Tin Oxide Surfaces
- Yue Kuo
- 1990
- Japanese Journal of Applied Physics
Slope control of molybdenum lines etched with reactive ion etching
- Yue Kuo
- J.R. Crowe
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Reactive ion etching of plasma enhanced chemical vapor deposition amorphous silicon and silicon nitride: Feeding gas effects
- Yue Kuo
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films