Bilayers with chromium disilicide: Chromium-vanadium
- T.G. Finstad
- O. Thomas
- et al.
- 1989
- Applied Surface Science
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25 results for O. Thomas
Diffusion of Sb, Ga, Ge, and (As) in TiSi2
- P. Gas
- G. Scilla
- et al.
- 1988
- Journal of Applied Physics
Diffusion of boron, phosphorus, and arsenic implanted in thin films of cobalt disilicide
- O. Thomas
- P. Gas
- et al.
- 1988
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
The diffusion of elements implanted in films of cobalt disilicide
- O. Thomas
- P. Gas
- et al.
- 1988
- Journal of Applied Physics
Tungsten-rhenium alloys as diffusion barriers between aluminum and silicon
- S.-E. Hörnström
- T. Lin
- et al.
- 1988
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films