PaperNovel diffusion phenomenon of dopants in silicon at low temperaturesM. Wittmer, P. Fahey, et al.Physical Review Letters
PaperInterface Properties of Hydrogenated Amorphous Carbon Films on Ge(100) SurfacesM. Wittmer, D. Ugolini, et al.JES
PaperProcessing of La1.8Sr0.2CuO4 and YBa 2Cu3O7 superconducting thin films by dual-ion-beam sputteringP.B. Madakson, J.J. Cuomo, et al.Journal of Applied Physics
PaperRedistribution of As during Pd2Si formation: Electrical measurementsM. Wittmer, C.-Y. Ting, et al.Journal of Applied Physics
