Wafer level integration of epitaxial piezoelectric thin films for novel NEMS, MEMS and MOEMS applications

Pb(Zr, Ti)O3 (PZT) and (PhMg1/3Nb2/3O3)2/3-CPbTiO3)1/3 (PMN-PT) thin films are epitaxially deposited on 200 mm wafers using Solmates' Pulsed Laser Deposition (PLD) platform. Epitaxy is achieved using an optimized TiN template layer on the lattice mismatched silicon. SrTiO3 was used as buffer layer and LaNiO3 as oxide bottom electrode after which PZT and PMN-PT were deposited. A fully epitaxial thin film stack was confirmed by XRD analysis and the degree of epitaxy was found to be homogeneous across the wafer. The ferro- and piezoelectric properties were measured and found to be stable upon 103 switching cycles.