A. Gupta, R. Gross, et al.
SPIE Advances in Semiconductors and Superconductors 1990
Finite element methods were used to mode both the thermal and structural response of the PREVAIL prototype mask during exposure heating. Equivalent modeling techniques were used to simulate a variety of pattern density distributions. Temperature rises of 3.8 K were observed in membranes immediately after e-beam exposure. Errors in stitching in both horizontally and vertically adjacent subfields were determined.
A. Gupta, R. Gross, et al.
SPIE Advances in Semiconductors and Superconductors 1990
A. Nagarajan, S. Mukherjee, et al.
Journal of Applied Mechanics, Transactions ASME
S.F. Fan, W.B. Yun, et al.
Proceedings of SPIE 1989
H.D. Dulman, R.H. Pantell, et al.
Physical Review B