Julian J. Hsieh
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
It is demonstrated that, contrary to previous proposals, Ga surface atoms are already involved in the oxidation process for the lowest observable oxygen coverages (0.01 monolayer). A similar involvement of As atoms could not be readily ascertained experimentally, although it is to be expected from energetic considerations. An oxidation model consisting of multiple bridge bonds to both Ga and As surface atoms is proposed, which is consistent with diverse experimental data for the GaAs(110) surface. © 1977.
Julian J. Hsieh
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Frank Stem
C R C Critical Reviews in Solid State Sciences
R. Ghez, M.B. Small
JES
Arvind Kumar, Jeffrey J. Welser, et al.
MRS Spring 2000