Temporal profile of optical transmission probe for pulsed-laser heating of amorphous silicon films

Abstract

The transient temperature field development during heating of an amorphous silicon (a-Si) film, deposited on a fused quartz substrate by pulsed excimer laser irradiation is studied. Experimental optical transmission data are compared with heat transfer modeling results. The temperature-dependence of the material complex refractive index through the thin film thickness is taken into account.