PaperThermally Developable, Positive Resist Systems with High SensitivityHiroshi Ito, Reinhold SchwalmJES
Conference paperIntegration of polymer self-assembly for lithographic applicationJoy Y. Cheng, Daniel P. Sanders, et al.SPIE Advanced Lithography 2008
PaperStudies of Chain Conformational Kinetics in Poly(di-n-alkylsilanes) by Spectroscopic Methods. 4. Piezochromism in Symmetrical Poly(di-n-alkylsilanes)Kigook Song, Robert D. Miller, et al.Macromolecules