Synchrotron radiation x-ray lithography: Recent results

Abstract

A beamline for making X-ray lithography exposures using synchrotron radiation has been built and is now in routine operation at Brookhaven National Laboratory. The beamline, its optics, and its control system are described, and results are presented showing the intensity and uniformity of the radiation at the wafer. Results of exposures in a variety of resists are shown and discussed. © 1984 SPIE.