Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
A third generation of synchrotron radiation facilities is coming on line worldwide, whose brilliance exceeds previous ultraviolet and x-ray light sources by four orders of magnitude. The capabilities at second and third generation light sources are discussed, using examples in surface and interface chemistry and magnetic nanostructures. The authors' experience at the IBM-Tennessee-Tulane-LLNL-LBL undulator beam line will serve as a hands-on guide for work at one of the new facilities. © 1995.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
P.C. Pattnaik, D.M. Newns
Physical Review B
Eloisa Bentivegna
Big Data 2022
Thomas H. Baum, Carl E. Larson, et al.
Journal of Organometallic Chemistry