Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
We use a scanning tunneling microscope (STM) to reposition individual C60 molecules adsorbed on a wellordered monolayer of 4, 4′-dimethylbianthrone (DMB), first grown on Cu(111). The surface binding energies and diffusion barriers of C60 molecules are substantially modified when the molecules bond to DMB instead of to Cu. The tip of the STM can be used to reposition single, isolated C60 molecules across the surface without disrupting the DMB film underneath. © 1998 Springer-Verlag.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Mark W. Dowley
Solid State Communications
Biancun Xie, Madhavan Swaminathan, et al.
EMC 2011
Ranulfo Allen, John Baglin, et al.
J. Photopolym. Sci. Tech.