R.I. Altkorn, J.C. Andreshak, et al.
Applied Physics A Solids and Surfaces
We report on the preparation of YBCO thin films by single target ion-beam deposition. A YBCO film deposited in-Situ on LaAI03, at a substrate temperature of 675°C and assisted by an atomic oxygen source, had a Tc of 80K. A YBCO film deposited in-Situ on LaAI03, at a substrate temperature of 750°C and assisted by a molecular oxygen source, had a Tcof 83K. A YBCO film deposited on a room temperature MgO substrate and followed by exsitu post annealing had a Tcof 80K. The properties of these films were studied through microscopy, stoichiometry, x-ray diffraction, Auger analysis and Tcmeasurements. © 1991 IEEE
R.I. Altkorn, J.C. Andreshak, et al.
Applied Physics A Solids and Surfaces
T.R. McGuire, S.J. La Placa, et al.
Journal of Applied Physics
L. Krusin-Elbaum, C.C. Tsuei, et al.
Nature
A. Gupta, B.W. Hussey, et al.
Journal of Solid State Chemistry