Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
No abstract available.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Heng Cao, Haifeng Xi, et al.
WSC 2003
Kenneth L. Clarkson, K. Georg Hampel, et al.
VTC Spring 2007
George Markowsky
J. Math. Anal. Appl.