J.K. Gimzewski, T.A. Jung, et al.
Surface Science
A technique for collecting spatially resolved optical emission from large rf plasma reactors is described. To demonstrate the sensitivity and versatility of this technique, emission within the quartz ultraviolet, 225-253 nm, was studied with particular emphasis on the "plasma dark space." Spatial variations of CF2, AlF, and C atom emission were monitored. These results have been used for discussion and evaluation of various plasma excitation and reaction mechanisms involving atomic carbon in fluorocarbon plasmas. © 1985 Plenum Publishing Corporation.
J.K. Gimzewski, T.A. Jung, et al.
Surface Science
R.M. Macfarlane, R.L. Cone
Physical Review B - CMMP
S. Cohen, T.O. Sedgwick, et al.
MRS Proceedings 1983
Frank R. Libsch, Takatoshi Tsujimura
Active Matrix Liquid Crystal Displays Technology and Applications 1997