Yi-Chia Chou, Mark C. Reuter, et al.
Microscopy and Microanalysis
Using site controlled growth of single vapor-liquid-solid silicon nanowires high aspect ratio atomic force microscope probes are fabricated on a wafer scale. Nanowire probe aspect ratios as high as 90:1 are demonstrated. Probe performance and limitations are explored by imaging high aspect ratio etched silicon structures using atomic force microscopy. Silicon nanowire probes are an ideal platform for non-destructive topographic imaging of high aspect ratio features. © 2012 American Institute of Physics.
Yi-Chia Chou, Mark C. Reuter, et al.
Microscopy and Microanalysis
P.A. Bennett, David J. Smith, et al.
Nanotechnology
Jeung Hun Park, Mark C. Reuter, et al.
Microscopy and Microanalysis
Maha Mohammed Khayyat, Brent A. Wacaser, et al.
Communications and Photonics Conference 2011