Investigations of silicon nano-crystal floating gate memories
Arvind Kumar, Jeffrey J. Welser, et al.
MRS Spring 2000
By rheology experiments we show that the torque created by sliding friction between a polyurethane foam planarizing pad and patterned silicon dioxide wafer in contact creates a large second-order tensile normal force previously found only in the torsion of bulk specimens. The normal force is a linear function of the square of the torque. Such tensile force reduces the applied compressive force. With elaborate polishing experiments we found second-order normal extension of the polymer into the valleys of the opposing surface which by interlocking the interface may provide a new mechanism for friction. © 2003 Plenum Publishing Corporation.
Arvind Kumar, Jeffrey J. Welser, et al.
MRS Spring 2000
A. Girlando, J.G. Gordon II, et al.
Surface Science
J. Tersoff
Applied Surface Science
Ming L. Yu, Lisa A. DeLouise
Surface Science Reports