Eduard Cartier, Martin M. Frank, et al.
IRPS 2018
The direct impact of the SiO2/4H-SiC interface state density (Dit) on the channel mobility of lateral field-effect transistors is studied by tailoring the trap distribution via nitridation of the thermal gate oxide. We observe that mobility scales like the inverse of the charged state density, which is consistent with Coulomb-scattering-limited transport at the interface. We also conclude that the Dit further impacts even the best devices by screening the gate potential, yielding small subthreshold swings and poor turn-ON characteristics. © 2011 IEEE.
Eduard Cartier, Martin M. Frank, et al.
IRPS 2018
S. Kim, John A. Ott, et al.
IEDM 2019
Pouya Hashemi, Takashi Ando, et al.
VLSI Technology 2016
Eduard Cartier, Wanki Kim, et al.
IRPS 2019