Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
We have employed ultraviolet photoemission spectroscopy at hν = 21.2 and 40.8 eV and inverse photoemission spectroscopy at hν = 9.5 eV to study Nd2-xCexCuO4-y (x = 0.0, 0.1, 0.15, 0.2). We observe a shift of the Fermi level to higher energies as a function of x. The total shift is 0.3 eV and saturates at x = 0.2. As suggested by existing band-structure calculations, this result seems to point to a rigid-band filling of the Ce-derived electrons in these "electron-doped" superconducting cuprates. © 1990.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
Thomas E. Karis, C. Mark Seymour, et al.
Rheologica Acta
J. Tersoff
Applied Surface Science