An analysis of EUV resist stochastic printing failures
Martha I. Sanchez, Gregory M. Wallraff, et al.
EUVL 2019
We describe the details of construction and operation of an instrument useful for the characterization of dissolution kinetics of thin films. This device, based on a quartz crystal microbalance operating in contact with a liquid, avoids the limitations associated with the use of optical, electrical, and mechanical dissolution rate measurement techniques. The QCM rate monitor has general application to the measurement of the kinetics of dissolution of transparent and opaque thin films such as dielectrics, metals, and polymeric resists.
Martha I. Sanchez, Gregory M. Wallraff, et al.
EUVL 2019
Andrew J. Merriam, Donald S. Bethune, et al.
SPIE Advanced Lithography 2007
Ramakrishnan Ayothi, Lovejeet Singh, et al.
Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
Marc Husemann, Michael Morrison, et al.
JACS