Daniel J. Coady, Amanda C. Engler, et al.
ACS Macro Letters
Two quartz crystal microbalances have been mounted in a planar rf discharge system in such a way that the potential of the microbalances with respect to the glow discharge can be varied. This apparatus allows a rapid simulation of the etching directionality that can be expected in real pattern transfer situations in that operating one microbalance at ground and one at a negative potential gives a measure of the sidewall and vertical etch rates, respectively. The voltage threshold for ion-assisted etching has been determined to be 20 V which is the approximate value of the plasma potential in this asymmetric system. © 1986 Plenum Publishing Corporation.
Daniel J. Coady, Amanda C. Engler, et al.
ACS Macro Letters
O.F. Schirmer, K.W. Blazey, et al.
Physical Review B
Q.R. Huang, Ho-Cheol Kim, et al.
Macromolecules
David B. Mitzi
Journal of Materials Chemistry