Conference paperAqueous base developable deep uv resist systems based on novel monomeric and polymeric dissolution inhibitorsHiroshi ItoProceedings of SPIE 1989
Conference paperHydrogen bonding and aqueous base dissolution behavior of hexafluoroisopropanol-bearing polymersHiroshi Ito, William D. Hinsberg, et al.Microlithography 2003
PaperNovel Polymeric Dissolution Inhibitor for the Design of Sensitive, Dry Etch Resistant, Base-Developable ResistHiroshi Ito, Elizabeth Flores, et al.JES
Conference paperRational design in cyclic olefin resists for sub-100nm lithographyWenjie Li, P. Rao Varanasi, et al.Microlithography 2003
