Hiroshi Ito, Reinhold Schwalm
JES
The dielectric properties are reported for nanoporous thin films of poly(methyl silsesquioxane) (MSSQ) for use as an ultralow, dielectric intermetal insulator. Direct experimental conformation is provided that the films have low dielectric constants with low loss up to 10 GHz. Low-frequency measurements are also reported.
Hiroshi Ito, Reinhold Schwalm
JES
Ellen J. Yoffa, David Adler
Physical Review B
E. Babich, J. Paraszczak, et al.
Microelectronic Engineering
Arvind Kumar, Jeffrey J. Welser, et al.
MRS Spring 2000