Bonding, interfacial effects and adhesion in dlc
A. Grill, B.S. Meyerson, et al.
Proceedings of SPIE 1989
Based on UV measurements at 157 nm of in-house fluoropolymers we have selected α-trifluoromethylacrylate and norbornene beating a pendant hexafluoroisopropanol group as our building blocks for 157 nm resist polymers. Polymers consisting of these repeat units have an optical density/μm of 3 or below at 157 nm. We have found that the α-trifluoromethylacrylate derivatives conveniently undergo radical copolymerization with norbornenes, which has provided a breakthrough in preparation of our 157 nm resist polymers. This approach offers flexibility and versatility because an acidic moiety or acid-labile group can be placed in either acrylate or norbornene repeat unit. Other platforms of interest include all-acrylic, all-norbornene, and acrylic-styrenic polymers. © 2001 SPIE - The International Society for Optical Engineering.
A. Grill, B.S. Meyerson, et al.
Proceedings of SPIE 1989
Heinz Koeppl, Marc Hafner, et al.
BMC Bioinformatics
T. Graham, A. Afzali, et al.
Microlithography 2000
Igor Devetak, Andreas Winter
ISIT 2003