Conference paper
Compression for data archiving and backup revisited
Corneliu Constantinescu
SPIE Optical Engineering + Applications 2009
A primary consideration in the design of 193nm single layer resists involves the choice of the polymer platform on which the resist is to be constructed. Two main routes (acrylics and cyclic olefins) exist for 193nm resist design. The advantages and challenges of each will be illustrated and discussed. ©1998TAPJ.
Corneliu Constantinescu
SPIE Optical Engineering + Applications 2009
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