G. Will, N. Masciocchi, et al.
Zeitschrift fur Kristallographie - New Crystal Structures
A primary consideration in the design of 193nm single layer resists involves the choice of the polymer platform on which the resist is to be constructed. Two main routes (acrylics and cyclic olefins) exist for 193nm resist design. The advantages and challenges of each will be illustrated and discussed. ©1998TAPJ.
G. Will, N. Masciocchi, et al.
Zeitschrift fur Kristallographie - New Crystal Structures
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JES
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SPIE Advanced Lithography 2008