William Hinsberg, Joy Cheng, et al.
SPIE Advanced Lithography 2010
Paper
Pitting of Sputtered Aluminum Alloy Thin Films
Abstract
A number of Al binary alloy thin films were studied over a range of composition up to 40% solute using a co-sputtering technique with the substrates at room temperature. These Al alloy films were tested in 0.1 M NaCl and found to have extraordinary pitting resistance. © 1989, The Electrochemical Society, Inc. All rights reserved.
Related
Xikun Hu, Wenlin Liu, et al.
IEEE J-STARS
T. Schneider, E. Stoll
Physical Review B
Shu-Jen Han, Dharmendar Reddy, et al.
ACS Nano