Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
We have measured the in-plane motion of photoexcited carriers in semiconductor quantum wells and have discovered several surprising results. The effective diffusivity of the carriers at densities below n=2×1011 cm-2 is found to depend upon the excitation level, possibly indicating defect-limited diffusion or phonon-wind effects. Above this density the spatial profiles exhibit two distinct components with widely differing diffusivities. We postulate that the slowly diffusing component represents carriers which are "thermally confined" to a phonon hot spot. © 1988 The American Physical Society.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
S.F. Fan, W.B. Yun, et al.
Proceedings of SPIE 1989
Sharee J. McNab, Richard J. Blaikie
Materials Research Society Symposium - Proceedings
E. Burstein
Ferroelectrics