Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
CdSe/CdS nanocrystals are studied by electrostatic force microscopy (EFM) on n- and p-type silicon with 2-nm surface oxide and graphite for comparison. In the absence of above-band-gap excitation, the nanocrystals are not in electrical equilibrium with the substrates. Upon continuous photoexcitation, the particles behave differently on each substrate. On n-type silicon, the particles exhibit predominantly positive charge. However, on p-type silicon, fewer charged particles overall are seen, blinking is more common, and the ratio of negative to positive particles is higher. The low ionization yield on p-Si is apparently due to the fast return of photoexcited electrons that are confined near the silicon/oxide interface by band bending. Nanocrystal photoionization dynamics are sensitive to the state of the silicon across the 2-nm oxide. On graphite, the particles show a greater propensity to oscillate between positive, negative, and neutral states than on the other substrates.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
S. Cohen, J.C. Liu, et al.
MRS Spring Meeting 1999
Q.R. Huang, Ho-Cheol Kim, et al.
Macromolecules
P. Martensson, R.M. Feenstra
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films