Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Photochemical hole-burning was used to study vibronic relaxation in the S1←S0 transition of H2P in n-octane at 4.2 K. Vibronic lines up to 1600 cm-1 above the origin were measured. The holewidths differ strongly and do not appear to be correlated with the excess in energy above the 0-0 transition. © 1979.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
J.H. Kaufman, Owen R. Melroy, et al.
Synthetic Metals
Sharee J. McNab, Richard J. Blaikie
Materials Research Society Symposium - Proceedings
O.F. Schirmer, K.W. Blazey, et al.
Physical Review B