Phenomena produced by ion bombardment in plasma-assisted etching environments

Harold F. Winters

doi:10.1116/1.575225

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Paper

01 Jan 1988

Phenomena produced by ion bombardment in plasma-assisted etching environments

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Abstract

The emphasis of this review paper will be to summarize recent experimental results, describe and evaluate contemporary concepts in the etching field, and to provide references to recent work. © 1988, American Vacuum Society. All rights reserved.

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