Conference paper
Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Some results concerning the well-posedness of the hydrodynamic model of semiconductor devices in two dimensions are given. We show the non-ellipticity of the stationary model; give representations which exhibit its elliptic and hyperbolic components, and obtain some appropriate boundary conditions from an examination of the time-dependent problem. © 1990 James & James
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
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Proceedings of SPIE 1989
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