On the Use of Coset Codes in Asymmetric Channels

Kafai Lai, Alan E. Rosenbluth, et al.

SPIE Advanced Lithography 2007

Fan Zhang, Junwei Cao, et al.

IEEE TETC

Hans Becker, Frank Schmidt, et al.

Photomask and Next-Generation Lithography Mask Technology 2004

Ziyang Liu, Sivaramakrishnan Natarajan, et al.

VLDB