Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
We first derive the bound |det(λI - A)|≤λk - λk0 (λ0≤λ), where A is a k × k nonnegative real matrix and λ0 is the spectral radius of A. If A is irreducible and integral, and its largest nonnegative eigenvalue is an integer n, then we use this inequality to derive the upper bound nk-1 on the components of the smallest integer eigenvector corresponding to n. Finer information on the components is also derived. © 1987.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
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Microlithography 2003
Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007
David L. Shealy, John A. Hoffnagle
SPIE Optical Engineering + Applications 2007