Ehud Altman, Kenneth R. Brown, et al.
PRX Quantum
The use of negative acting photoresists has become a integral part of device fabrication strategy. In this paper we will discuss a phenolic based photoresist which incorporates a crosslinkable resin and an acid generating sensitizer. When exposed and thermally treated, the resist forms a negative tone image which is developable in an alkaline medium. We will discuss the materials, processes and results from photon, electron and X-ray lithographic evaluations.
Ehud Altman, Kenneth R. Brown, et al.
PRX Quantum
R.B. Morris, Y. Tsuji, et al.
International Journal for Numerical Methods in Engineering
Imran Nasim, Michael E. Henderson
Mathematics
Jianke Yang, Robin Walters, et al.
ICML 2023