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Paper
Nanoscale patterning using self-assembled polymers for semiconductor applications
Abstract
Thin films of an ordered polystyrene-polymethyl(methacrylate) (PS-PMMA) diblock copolymer was formed over full 8-in.-diam silicon wafers and on various substrate materials. The important process parameters for forming the nanoscale templates were analyzed. It was found that under proper conditions, well-ordered hexagonal arrays of sub-20 nm domains can be formed on a tight pitch.