R. Ghez, M.B. Small
JES
Thin films of an ordered polystyrene-polymethyl(methacrylate) (PS-PMMA) diblock copolymer was formed over full 8-in.-diam silicon wafers and on various substrate materials. The important process parameters for forming the nanoscale templates were analyzed. It was found that under proper conditions, well-ordered hexagonal arrays of sub-20 nm domains can be formed on a tight pitch.
R. Ghez, M.B. Small
JES
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Julien Autebert, Aditya Kashyap, et al.
Langmuir
Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008