Paul M. Ferm, Sarah R. Kurtz, et al.
Physical Review Letters
A nanomolding process for producing 55-nm-diameter magnetic islands over 3-cm-wide areas is described. A master pattern of SiO2 pillars is used to form a polymeric mold, which is in turn used to mold a photopolymer resist film. This latter film is used as a resist for etching SiO2, yielding a pattern of pillars. Finally, an 11-nm-CoPt multilayer is deposited. Magnetic force microscopy reveals that the film on top of each pillar is a magnetically isolated single domain that switches independently. © 2002 American Institute of Physics.
Paul M. Ferm, Sarah R. Kurtz, et al.
Physical Review Letters
Qiu Dai, Charles T. Rettner, et al.
Journal of Materials Chemistry
Charles T. Rettner, Lisa A. DeLouise, et al.
JVSTA
John H. Frederick, Gary M. McClelland, et al.
The Journal of Chemical Physics