Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007
Systems of difference equations containing small parameters are studied by a constructive perturbation scheme analogous to the one developed by the authors for the study of differential equations. The method results in an averaging procedure for difference equations, and it is particularly well suited to certain highly oscillatory, nonlinear systems. The method is applied to problems from population genetics, pattern recognition, and the numerical analysis of stiff differential equations.
Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007
Frank R. Libsch, Takatoshi Tsujimura
Active Matrix Liquid Crystal Displays Technology and Applications 1997
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Daniel J. Costello Jr., Pierre R. Chevillat, et al.
ISIT 1997