Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Using the conventional drift-diffusion model, multiple steady state solutions are constructed for a PNPN-junction structure using a combination of numerical and asymptotic techniques. We assume constant mobilities and a piecewise constant doping profile. © 1989.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
S.F. Fan, W.B. Yun, et al.
Proceedings of SPIE 1989
Martin Charles Golumbic, Renu C. Laskar
Discrete Applied Mathematics
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SPIE OE/LASE 1992