PublicationADMETA 2011Conference paperMn-dopant segregation as an indicator of barrier integrity in 32nm groundrule Cu/ultra-low K interconnectsADMETA 2011AbstractNo abstract available.Home↳ PublicationsDate01 Dec 2011PublicationADMETA 2011AuthorsAndrew H. SimonFrieder H. BaumannTibor BolomCharlie NiuKoichi MotoyamaPatrick DeHavenTakeshi NogamiIBM-affiliated at time of publicationTopicsPhysical SciencesShare
