Dynamics of ultraviolet laser ablation of polymer surfaces.
R. Srinivasan, E. Sutcliffe, et al.
CLEO 1987
Short pulses of far-ultraviolet (193 nm) laser radiation are capable of etching organic polymer films without melting the remaining sample. The mechanism proposed for this ablative photodecomposition attributes ablation to the increase in volume that accompanies the photolysis of the polymer. A model of the microscopic process is presented here. The predictions of the model include ablation without melting, a mean perpendicular ejection velocity of 1300 m/s, and an angular distribution of the ablated material which has a narrow peak normal to the surface.
R. Srinivasan, E. Sutcliffe, et al.
CLEO 1987
Barbara J. Garrison, R. Srinivasan
Journal of Applied Physics
Thomas Baum, Angelo Rossi, et al.
JACS
Barbara J. Garrison, William A. Lester Jr., et al.
The Journal of Chemical Physics