PaperOxidation of silicon-germanium alloys. II. A mathematical modelP.-E. Hellberg, S.-L. Zhang, et al.Journal of Applied Physics
PaperDiffusion-reaction: Growth and nucleationF.M. D'Heurle, P. Gas, et al.Defect and Diffusion Forum
PaperAluminum films deposited by rf sputteringF.M. D'HeurleMetallurgical and Materials Transactions B
PaperFormation of iridium silicides from Ir thin films on Si substratesS. Petersson, J.E.E. Baglin, et al.Journal of Applied Physics
