A. Thete, Daniël Geelen, et al.
SPIE Advanced Lithography 2015
Measurement of chromatic aberration in a Low Energy Electron Microscope (LEEM) or Photo Electron Emission Microscope (PEEM) is necessary for quantitative image interpretation, and for accurate correction of chromatic aberration in an aberration-corrected instrument. While methods have been developed for measuring the spherical aberration coefficient, C 3 , measuring the chromatic aberration coefficient, C c , remains a more difficult task. Here a novel method is introduced to simplify such measurements. The viability and accuracy is demonstrated using detailed electron-optical ray-tracing calculations. Experimental results show that the method is easily reduced to practice.
A. Thete, Daniël Geelen, et al.
SPIE Advanced Lithography 2015
Krzysztof P. Grzelakowski, Rudolf M. Tromp
Ultramicroscopy
Frances M. Ross, Mark J. Williamson, et al.
Microscopy and Microanalysis
Matthew Copel, Satoshi Oida, et al.
Applied Physics Letters