Conference paper
Magnetic force microscopy. A short review
Y. Martin, D.W. Abraham, et al.
ECS Meeting 1989
Measurement and control of high-aspect-ratio structures such as dynamic random-access memory trenches is an important step in the manufacture of modern memory devices. We present a novel technique based on infrared interferometry that has been implemented in manufacturing and is capable of measuring sub-0.25-μm-wide and 10-μm-deep trenches nondestructively and with an accuracy of better than 0.1 μm. © 1999 Optical Society of America.
Y. Martin, D.W. Abraham, et al.
ECS Meeting 1989
Y. Martin, D. Rugar, et al.
Applied Physics Letters
Y. Martin, S. Rishton, et al.
Applied Physics Letters
M. Nonnenmacher, H.K. Wickramasinghe
Applied Physics Letters